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Revenue from ASML deep-ultraviolet lithography systems that use 193-nanometer argon-fluoride light without an immersion-water layer. Chipmakers use these dry systems for less demanding layers where their resolution and cost are a better fit than immersion or EUV tools.
arfDryNetSystemSalesRevenueNumber of ASML 193-nanometer argon-fluoride dry lithography systems recognized in revenue during the period. These tools print less demanding chip layers without the water-based optics used by higher-resolution immersion systems.
arfDryNetSystemSalesUnitsRevenue from ASML deep-ultraviolet lithography systems that project 193-nanometer argon-fluoride light through a thin layer of water between the lens and wafer. Immersion optics raise resolution beyond dry systems, allowing chipmakers to print finer features on advanced layers.
arfImmersionNetSystemSalesRevenueNumber of ASML argon-fluoride immersion lithography systems recognized in revenue during the period. These tools use water between the projection lens and wafer to print finer chip features than dry deep-ultraviolet systems.
arfImmersionNetSystemSalesUnitsAnnual net sales attributed to systems shipped to China.
chinaRevenueAnnual net sales attributed to systems shipped to Europe, the Middle East and Africa, including the Netherlands.
europeMiddleEastAndAfricaRevenueIncludingNetherlandsRevenue from ASML extreme-ultraviolet lithography systems, which use 13.5-nanometer light and reflective optics in a vacuum to print the smallest features on advanced logic and memory chips. EUV's much shorter wavelength reduces the number of patterning steps needed for leading-edge layers.
euvNetSystemSalesRevenueNumber of ASML extreme-ultraviolet lithography systems recognized in revenue during the period. These 13.5-nanometer tools print the most advanced logic and memory chip layers and include both NXE and High-NA EXE platforms when sold.
euvNetSystemSalesUnitsRevenue from ASML i-line lithography systems, which use 365-nanometer ultraviolet light to print mature, less complex chip layers. The technology predates deep-ultraviolet and EUV tools and is used where leading-edge resolution is unnecessary.
iLineNetSystemSalesRevenueNumber of ASML i-line lithography systems recognized in revenue during the period. These 365-nanometer ultraviolet tools serve mature and less demanding chip-production layers.
iLineNetSystemSalesUnitsAnnual net sales attributed to systems shipped to Japan.
japanRevenueRevenue from ASML deep-ultraviolet lithography systems that use 248-nanometer krypton-fluoride lasers. KrF tools print mature and supporting chip layers that need more resolution than i-line systems but not the capabilities of ArF immersion or EUV.
krfNetSystemSalesRevenueNumber of ASML krypton-fluoride deep-ultraviolet lithography systems recognized in revenue during the period. These 248-nanometer tools are used for mature and supporting layers across a wide range of chips.
krfNetSystemSalesUnitsAnnual net system sales revenue from systems sold for logic end-use applications.
logicNetSystemSalesRevenueAnnual number of net systems sold for logic end-use applications.
logicNetSystemSalesUnitsAnnual net system sales revenue from systems sold for memory end-use applications.
memoryNetSystemSalesRevenueAnnual number of net systems sold for memory end-use applications.
memoryNetSystemSalesUnitsRevenue from ASML YieldStar optical metrology and HMI electron-beam systems that measure wafer-pattern alignment, dimensions and defects. Chipmakers use the measurements to control production processes and improve the share of functioning chips on each wafer.
metrologyAndInspectionNetSystemSalesRevenueNumber of ASML optical metrology and electron-beam inspection systems recognized in revenue during the period. These tools measure pattern placement and dimensions and locate defects so chipmakers can control processes and improve wafer yield.
metrologyAndInspectionNetSystemSalesUnitsNet sales revenue from lithography, metrology and inspection systems during the period.
netSystemSalesRevenueCount of new lithography systems recognized in net system sales reported by ASML Holding NV during the period. This is activity over the reporting period rather than a period-end population.
newLithographySystemSalesUnitsAnnual net system sales revenue from new systems.
newSystemSalesRevenueRevenue ASML Holding NV reports for geographic markets not separately disclosed in its geographic revenue breakdown during the period, measured in euros.
otherRevenueByGeographyAnnual net sales attributed to systems shipped to Asian markets other than China, Japan, Singapore, South Korea and Taiwan.
restOfAsiaRevenueRevenue from maintaining, repairing and upgrading ASML lithography systems already operating in customer fabs, including field-installed options that improve capacity or performance. ASML also calls this Installed Base Management sales, so it grows with the size and use of the installed fleet as well as upgrade activity.
serviceAndFieldOptionRevenueAnnual net sales attributed to systems shipped to Singapore.
singaporeRevenueAnnual net sales attributed to systems shipped to South Korea.
southKoreaRevenueAnnual net sales attributed to systems shipped to Taiwan.
taiwanRevenueAnnual net sales attributed to systems shipped to the United States.
unitedStatesRevenueCount of used lithography systems recognized in net system sales reported by ASML Holding NV during the period. This is activity over the reporting period rather than a period-end population.
usedLithographySystemSalesUnitsAnnual net system sales revenue from used systems.
usedSystemSalesRevenueValue of system sales orders and inflation-related adjustments accepted during the quarter.
netBookings